HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 2212885Generated: November 2, 2026
N,N'-Diisopropylethylenediamine → Benzoic Acid
https://huagongshe.com/reaction/2212885
Participants
| Role | Name | HCID | Charge |
|---|
| Reactant | N,N'-Diisopropylethylenediamine | HCID 77628 | — |
| Reactant | Diisopropylethylamine | HCID 81531 | — |
| Reactant | Trifluoroacetic acid water | HCID 22392675 | — |
| Solvent | Dimethyl Sulfoxide | HCID 679 | — |
| Product | Benzoic Acid | HCID 243 | — |
Reaction Steps
50 ml of DMSO, 2 ml of diisopropylethylamine and 5 ml of N,N′-diisopropylethylenediamine were added to the resin obtained in step 1 to conduct the reaction at 60° C. for 3 days. The reaction solution was removed. The resin was washed with DMSO, DMF and dichloromethane 3 times each and then dried under reduced pressure. 5 g of Fmoc-succinimide and 25 ml of NMP were added to the obtained resin, and they were stirred at room temperature for 16 hours. The superfluous solvent was removed. The resin was washed with DMF 3 times, with dichloromethane 3 times, with NMP twice and again with dichloromethane 3 times, and then dried under reduced pressure. The resin thus obtained was treated with 500 μl of trifluoroacetic acid/water (95/5) for 1 hour. The resin was taken by the filtration and then washed with trifluoroacetic acid. The wash solutions were combined together, concentrated and purified by the reversed-phase HPLC (ODS column, developer: water (containing 0.05% of TFA) and acetonitrile (containing 0.05% of TFA) to obtain a benzoic acid derivative having a partial structure in Example 28.
Provenance & Evidence
| DOI | 10.6084/m9.figshare.5104873.v1 |
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| Patent number | US07105520B2 |
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| Source dataset | uspto-grants-2006_09 |
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| ORD ID | ord-772a485728ef4c8aa801508c5b13aa1c |
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| Source note | uspto-grants-2006_09 |
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