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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 221941Generated: October 26, 2026

Chlorotrimethylsilane → 2-Trimethylsilanyl-naphthalene-1,4-dicarboxylic acid diisopropyl ester

https://huagongshe.com/reaction/221941

Reaction equation

Participants

RoleNameHCIDCharge
ReactantChlorotrimethylsilaneHCID 6397—
ReactantHexaneHCID 8058—
ReactantAmmonium ChlorideHCID 25517—
Reactant1,2,2,3-TetramethylpiperidineHCID 18761772—
ReactantNaphthalene-1,4-dicarboxylic acid diisopropyl esterHCID 57332763—
ReactantButyllithiumHCID 178418339—
SolventTetrahydrofuranHCID 8028—
Product2-Trimethylsilanyl-naphthalene-1,4-dicarboxylic acid diisopropyl esterHCID 5948878734.2%

Reaction Conditions

Temperature-78 °C

Reaction Steps

Under a nitrogen stream, to a solution of tetramethylpiperidine (0.39 mL, 2.311 mmol) in THF (1.8 mL) was added a solution of n-butyllithium in n-hexane (2.67 M, 0.87 mL, 2.323 mmol) under ice cooling, and the resultant solution was stirred for 10 minutes at the same temperature. The solution was cooled to −78° C., and then chlorotrimethylsilane (2.47 mL, 19.325 mmol) and a solution of naphthalene-1,4-dicarboxylic acid diisopropyl ester (0.58 g, 1.931 mmol) in THF (2 mL) were added thereto. The temperature of the solution was raised over 1 hour to room temperature, and then to the solution was added saturated aqueous ammonium chloride to stop the reaction. The resultant mixture was twice extracted with dichloromethane. After drying the organic layer over anhydrous magnesium sulfate, solvent was removed by distillation under reduced pressure. The resulting residue was purified by silica gel column chromatography (developing solution=ethyl acetate:n-hexane (1:9)), to thereby obtain the titled compound (246 mg, 34%).

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS08207134B2
Source datasetuspto-grants-2012_06
ORD IDord-cfac9f5661a940b8b11729c54f2796fb
Source noteuspto-grants-2012_06