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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 2226973Generated: October 31, 2026

Dichlorodimethylsilane → Silane, dichlorobis(3,3,4,4,5,5,6,6,6-nonafluorohexyl)-

https://huagongshe.com/reaction/2226973

Reaction equation

Participants

RoleNameHCIDCharge
ReactantDichlorodimethylsilaneHCID 6398—
ReactantChlorodimethylsilaneHCID 66108—
ReactantNonafluorohexyltrichlorosilaneHCID 11811026—
ReactantC4F9CH2CH2SiHCl2HCID 123586224—
CatalystTetrabutylammonium ChlorideHCID 70681—
ProductSilane, dichlorobis(3,3,4,4,5,5,6,6,6-nonafluorohexyl)-HCID 121233877—

Reaction Conditions

Temperature80 °C

Reaction Steps

3 moles C4F9CH=CH2 and 4.8 g isopropanolic chloroplatinic acid solution (concentration=10%) were placed in a flask and heated under reflux while stirring. 2.5 moles trichlorosilane was dripped in from an addition funnel over a period of 3 hours, and the reaction was then heated under reflux for another 5 hours. At this point, analysis by gas chromatography confirmed the disappearance of the C4F9CH=CH2, and C4F9CH2CH2SiCl3 was isolated by distillation at ambient pressure. The boiling point of this trichlorosilane was 162° C. 2 moles of this C4F9CH2CH2SiCl3, 3.5 moles Me2SiHCl, and 2.6 g tetra(n-butyl)ammonium chloride were placed in a flask and heated under reflux for 3 days while stirring. A mixture of chlorosilanes was then obtained by distillation in vacuo. Analysis by gas chromatography confirmed the main components of this reaction product to be C4F9CH2CH2SiCl3, C4F9CH2CH2SiHCl2, Me2SiHCl, and Me2SiCl2. The C4F9CH2CH2SiCl3 and C4F9CH2CH2SiHCl2 fraction was separated by distillation in vacuo, and the C4F9CH2CH2SiCl3 and C4F9CH2CH 2 SiHCl2 mixture was introduced into a flask along with 5 g isopropanolic chloroplatinic acid solution (concentration=10%). This was heated to 80° C., and C4F9CH=CH2 was added while stirring. This addition was discontinued when the peak for C4F9CH2CH2SiHCl2 disappeared in gas chromatographic analysis. Precision distillation in vacuo then afforded (C4F9CH2CH2)2SiCl2 (bp=128° C./20 mmHg).

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS05350824
Source datasetuspto-grants-1994_09
ORD IDord-d00f180c249744ce9979f0daf18ae80a
Source noteuspto-grants-1994_09