HuagongsheHuagongshe Chemistry Print Report · For research reference only
Trifluoroacetic acid → HCID 22086854, compound
Participants
| Role | Name | HCID | Charge |
|---|---|---|---|
| Reactant | Trifluoroacetic acid | HCID 6422 | — |
| Reactant | HCID 22281802 | HCID 22281802 | — |
| Solvent | Dichloromethane | HCID 6344 | — |
| Product | HCID 22086854 | HCID 22086854 | — |
Reaction Steps
To a solution of the compound obtained in Example 19 (0.53 g, 0.77 mol) in dichloromethane (20 ml) is added trifluoroacetic acid (0.24 ml, 3.07 mmol) with ice-cooling. An additional amount of trifluoroacetic acid (1.5 ml) is added at room temperature and is stirred for 5 hours at room temperature. The reaction mixture is partitioned between chloroform (100 ml) and aqueous saturated NaHCO3 solution (30 ml). The aqueous layer is extracted with chloroform (30 ml). The combined organic solution is washed with saturated saline (20 ml), dried over Na2SO4, successively evaporated under reduced pressure to give the residue, which is chromatographed on silica gel to afford a pale brown colorless amorphous (0.41 g, 90%).
Provenance & Evidence
| DOI | 10.6084/m9.figshare.5104873.v1 |
|---|---|
| Patent number | US06413972B1 |
| Source dataset | uspto-grants-2002_07 |
| ORD ID | ord-46875cc7dba84fd28591243e3df8c28d |
| Source note | uspto-grants-2002_07 |