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Huagongshe화공사 화학 정보 인쇄 보고서 · 연구 참고용
HRID 2246668생성일: 2026년 10월 26일

Cesium carbonate → (S)-4-(Dimethylamino)-4-oxo-3-(4-((5,5,8,8-tetramethyl-5,6,7,8-tetrahydronaphthalen-2-yl)methoxy)phenyl)butanoic acid

https://huagongshe.com/reaction/2246668

반응식

참여 물질

역할이름HCID투입량
반응물Cesium carbonateHCID 10796—
반응물Sodium HydroxideHCID 14798—
반응물6-(Bromomethyl)-1,1,4,4-Tetramethyl-1,2,3,4-TetrahydronaphthaleneHCID 2735597—
반응물(S)-Methyl 4-(dimethylamino)-3-(4-hydroxyphenyl)-4-oxobutanoateHCID 59855130—
용매MethanolHCID 887—
용매DimethylformamideHCID 6228—
용매Ethyl AcetateHCID 8857—
생성물(S)-4-(Dimethylamino)-4-oxo-3-(4-((5,5,8,8-tetramethyl-5,6,7,8-tetrahydronaphthalen-2-yl)methoxy)phenyl)butanoic acidHCID 59218522—

반응 단계

The phenol 22.2 (315 mg, 1.26 mmol) is dissolved in 5 mL of DMF and 6-bromomethyl-1,1,4,4-tetramethyl-1,2,3,4-tetrahydro-naphthalene (available from Maybridge) (1.38 mmol) is added followed by cesium carbonate (600 mg, 1.88 mmol). The reaction is stirred for 14 hours and diluted with 250 mL of EtOAc. The organic layer is washed with 1N HCl (aq) (50 mL), saturated NaHCO3 (aq) (50 mL), and brine (2×50 mL). The organic layer is dried with MgSO4, filtered, and concentrated under reduced pressure. The residue is dissolved in 15 mL THF and 0.111 N NaOH (aq) (16 mL, 1.78 mmol) and MeOH (10 mL) is added. The solution is stirred for 8 hours and concentrated to remove the organic solvent. The slurry is diluted with water (50 mL) and DCM (300 mL). The mixture is adjusted with 2 N HCl (aq) to a pH of 2 and then extracted with DCM (3×75 mL). The combined organic layers are dried with Na2SO4 and concentrated under reduced pressure. The residue is purified by flash chromatography to yield compound 22.

출처 및 근거

DOI10.6084/m9.figshare.5104873.v1
특허 번호US07687526B2
출처 데이터셋uspto-grants-2010_03
ORD IDord-c0e084b2ad2e47d7863991bd5edd0f6d
출처 메모uspto-grants-2010_03