HuagongsheHuagongshe Chemistry Print Report · For research reference only
Trifluoroacetic acid → HCID 53774617, compound
Participants
| Role | Name | HCID | Charge |
|---|---|---|---|
| Reactant | Trifluoroacetic acid | HCID 6422 | — |
| Reactant | Triethylsilane | HCID 12052 | — |
| Reactant | HCID 19707310 | HCID 19707310 | — |
| Solvent | Dichloromethane | HCID 6344 | — |
| Product | HCID 53774617 | HCID 53774617 | 65.9% |
Reaction Steps
To a stirred solution of subtitle compound from Step B (693 mg) in CH2Cl2 (2.5mL) under a nitrogen atmosphere was added triethylsilane (1.4 ml) The reaction mixture was stirred for 15 minutes. To the solution was added 1.5 mL of trifluoroacetic acid and the reaction mixture stirred at room temperature overnight. The reaction mixture was partitioned between CHCl3 and saturated NaHCO3. The organic phase was dried over Na2SO4 and the solvent removed under vacuum. The residue was purified by chromatography on SiO2 (25% ethyl acetate in hexanes as eluent). The product containing fractions were evaporated under vacuum to afford 459 mg of the subtitle compound as a foam. Melting point 55°-60° C.
Provenance & Evidence
| DOI | 10.6084/m9.figshare.5104873.v1 |
|---|---|
| Patent number | US05239075 |
| Source dataset | uspto-grants-1993_08 |
| ORD ID | ord-01d35965e01f48b3b4c851466dd30eca |
| Source note | uspto-grants-1993_08 |