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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 2255270Generated: October 29, 2026

Trifluoroacetic acid → HCID 53774617, compound

https://huagongshe.com/reaction/2255270

Reaction equation

Participants

RoleNameHCIDCharge
ReactantTrifluoroacetic acidHCID 6422—
ReactantTriethylsilaneHCID 12052—
ReactantHCID 19707310HCID 19707310—
SolventDichloromethaneHCID 6344—
ProductHCID 53774617HCID 5377461765.9%

Reaction Steps

To a stirred solution of subtitle compound from Step B (693 mg) in CH2Cl2 (2.5mL) under a nitrogen atmosphere was added triethylsilane (1.4 ml) The reaction mixture was stirred for 15 minutes. To the solution was added 1.5 mL of trifluoroacetic acid and the reaction mixture stirred at room temperature overnight. The reaction mixture was partitioned between CHCl3 and saturated NaHCO3. The organic phase was dried over Na2SO4 and the solvent removed under vacuum. The residue was purified by chromatography on SiO2 (25% ethyl acetate in hexanes as eluent). The product containing fractions were evaporated under vacuum to afford 459 mg of the subtitle compound as a foam. Melting point 55°-60° C.

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS05239075
Source datasetuspto-grants-1993_08
ORD IDord-01d35965e01f48b3b4c851466dd30eca
Source noteuspto-grants-1993_08