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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 2288558Generated: October 30, 2026

Chlorotrimethylsilane → HCID 9936243, compound

https://huagongshe.com/reaction/2288558

Reaction equation

Participants

RoleNameHCIDCharge
ReactantChlorotrimethylsilaneHCID 6397—
ReactantTert-Butyl nitriteHCID 10906—
ReactantHCID 9913636HCID 9913636—
SolventDichloromethaneHCID 6344—
ProductHCID 9936243HCID 9936243—

Reaction Steps

t-Butyl nitrite (0.07 ml) was added dropwise to a stirred solution of trimethylsilyl chloride (0.08 ml) in anhydrous dichloromethane (2.5 ml) at about -5° C. After a further 5 minutes, a solution of the title compound of Example 8 (0.10 g) in anhydrous dichloromethane (4.5ml) was added dropwise, whilst maintaining the reaction temperature below -5° C. Next, the reaction mixture was allowed to warm to room temperature, stirred for 45 minutes more and then evaporated under reduced pressure. The residue was purified by column chromatography on silica gel, using mixtures of hexane:dichloromethane (9:1 then 4:1) as eluants, to afford the title compound as a colourless gum. δ (CDCl3): 1.85 (t,1H), 2.25 (dd,1H), 2.70 (dd,1H), 7.35 (s,1H), 7.75 (s,2H). MS (thermospray): M/Z [M+H] 510.7; C13H6Br2Cl3F3N2 +H requires 510.80.

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS06090394
Source datasetuspto-grants-2000_07
ORD IDord-970ebfcb37074694bbc0d570732a9019
Source noteuspto-grants-2000_07