HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 2293579Generated: October 30, 2026
Dimethyl Sulfoxide → HCID 21476919, compound
https://huagongshe.com/reaction/2293579
Participants
| Role | Name | HCID | Charge |
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| Reactant | Dimethyl Sulfoxide | HCID 679 | — |
| Reactant | 1-(Bromomethyl)-4-(trifluoromethyl)benzene | HCID 123062 | — |
| Reactant | Lithium Hexamethyldisilazide | HCID 2733832 | — |
| Reactant | HCID 21476920 | HCID 21476920 | — |
| Solvent | Tetrahydrofuran | HCID 8028 | — |
| Product | HCID 21476919 | HCID 21476919 | 28.5% |
Reaction Steps
To a suspension of 0.992 g (0.27 mmol) of the product of Example 1 in 0.5 mL of anhydrous THF was added 825 μL (0.82 mmol) of a 1.0M solution of lithium bis(trimethylsilyl)amide in THF at -78° C. under a nitrogen atmosphere. After stirring at -78° C. for 10 minutes, the starting material had not fully dissolved. The reaction mixture was then warmed to 0° C. (ice-water bath) and 300 μL of DMSO was added which resulted in a clear yellow solution, then 0.131 g (0.55 mmol) of α'-bromo-α,α,α-trifluoro-p-xylene was added as a solid. Stirring was maintained for 1 hour, then the reaction mixture was partitioned between EtOAc and water and extracted. The organic layer was washed with saturated brine, dried (MgSO4), filtered and evaporated. The residue was purified on a silica gel flash chromatography column eluted with 2.5% MeOH--CHCl3. Evaporation of the product fractions and drying in vacuo afforded 0.040 g (28%) of the title compound.
Provenance & Evidence
| DOI | 10.6084/m9.figshare.5104873.v1 |
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| Patent number | US05686478 |
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| Source dataset | uspto-grants-1997_11 |
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| ORD ID | ord-17f07d8ce02448cb879640cfe7d7c92a |
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| Source note | uspto-grants-1997_11 |
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