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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 2306270Generated: October 31, 2026

Chlorotrimethylsilane → HCID 18433505, compound

https://huagongshe.com/reaction/2306270

Reaction equation

Participants

RoleNameHCIDCharge
ReactantChlorotrimethylsilaneHCID 6397—
ReactantN,N,N',N'-TetramethylethylenediamineHCID 8037—
ReactantHCID 18433611HCID 18433611—
ReactantCID 53628100HCID 178418400—
SolventTetrahydrofuranHCID 8028—
ProductHCID 18433505HCID 18433505—

Reaction Conditions

Temperature-78 °C

Reaction Steps

To a solution of 1-(tert-butoxycarbonylamino)-7-(triisopropylsilyloxy) naphthalene, as described above in Step A, (12.47 g, 30.0 mmol) and N,N,N′,N′-tetramethylethylenediamine (10.0 mL, 66.0 mmol) in THF (300 mL) at −78° C. was added sec-butyllithium (1.3 M in cyclohexane, 24.2 mL, 31.5 mmol) dropwise. The reaction mixture was stirred at −78° C. for 5 min, then trimethylsilyl chloride (4.2 mL, 33.0 mmol) was added dropwise and stirring was continued for 30 min. sec-Butyllithium (1.3 M in cyclohexane, 24.2 mL, 31.5 mmol) was added and the mixture was stirred dropwise was stirred at −78° C. for 5 hours, then quenched with saturated aqueous NH4Cl (400 mL) and extracted with CH2Cl2 (2×500 mL). The combined organic extracts were dried over Na2SO4, filtered, and concentrated in vacuo. The crude product was purified by flash column chromatography on silica, eluting with a gradient of hexane—30% to 50% CH2Cl2 to yield the above-titled product.

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS06441017B1
Source datasetuspto-grants-2002_08
ORD IDord-566756641f42477cb9d6083402122e38
Source noteuspto-grants-2002_08