Thionyl Chloride → HCID 14881122, compound

HRID 2352596Notes

Reaction equation

HRID 2352596 reaction equation
S(Cl)([Cl:3])=O.O[CH2:6][CH2:7][N:8]1[C:13]([CH3:14])=[C:12]([CH3:15])[N:11]=[C:10]([CH2:16][C:17]2[CH:22]=[CH:21][CH:20]=[CH:19][CH:18]=2)[C:9]1=[O:23]>C(Cl)(Cl)Cl>[Cl:3][CH2:6][CH2:7][N:8]1[C:13]([CH3:14])=[C:12]([CH3:15])[N:11]=[C:10]([CH2:16][C:17]2[CH:22]=[CH:21][CH:20]=[CH:19][CH:18]=2)[C:9]1=[O:23]

Participants

4

Reactant 2

HCID 24386Thionyl ChlorideHCID 14881121HCID 14881121, compound

Product 1

HCID 14881122HCID 14881122, compoundYield 87.5%

Reagents, catalysts & solvents 1

HCID 6212ChloroformSolvent2×

Procedure

Thionylchloride (0.42 ml, 6.0 mM) was added dropwise under ice-cooling to a compound 112 (1.29 g, 5 mM) dissolved in chloroform (6 ml), and stirred at room temperature for 5 hours. Chloroform (70 ml) was added to the reaction mixture, which mixture was then washed with dilute aqueous K2CO3, the resulting aqueous layer being twice extracted with further chloroform. The chloroform layer was combined, dried with anhydrous magnesium sulfate and concentrated in vacuo. The residue was charged on a column of silica-gel (C-200, 25 g), packed with chloroform, and eluted with chloroform to obtain compound 613 (1.00 g, yield: 87.5%).

Workup

  1. washwas then washed with dilute aqueous K2CO3
  2. extractionthe resulting aqueous layer being twice extracted with further chloroform
  3. dry with materialdried with anhydrous magnesium sulfate
  4. concentrationconcentrated in vacuo
  5. additionThe residue was charged on a column of silica-gel (C-200, 25 g)
  6. washeluted with chloroform

Sources & evidence

ORD record
ord-48d2ae3cc1474f1c942abacc500b7aeb
Source dataset
uspto-grants-1989_10
Patent number
US04877875

Reaction notes

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