HuagongsheHuagongshe Chemistry Print Report · For research reference only
Trifluoroacetic acid → HCID 22065959, compound
Participants
| Role | Name | HCID | Charge |
|---|---|---|---|
| Reactant | Trifluoroacetic acid | HCID 6422 | — |
| Reactant | HCID 22065985 | HCID 22065985 | — |
| Solvent | Dichloromethane | HCID 6344 | — |
| Product | HCID 22065959 | HCID 22065959 | — |
Reaction Steps
The product from Example 11B (0.48 g, 1.40 mmol) in CH2Cl2 (20 mL) was treated with TFA (20 mL) and stirred for 1 hour. The mixture was concentrated under reduced pressure and the residue was purified by flash chromatography (10% MeOH/CH2Cl2/1% NH4OH) to provide the title compound. 1H NMR (CD3OD, 300 MHz) δ 1.85-1.98 (m, 4H), 2.58-2.68 (m, 2H), 3.45-3.57 (m, 4H), 3.67 (s, 2H), 6.25 (s, 1H), 6.75-6.90 (m, 1H), 7.10-7.25 (m, 2H); MS (DCI/NH3) m/z 248 (M+H)+.
Provenance & Evidence
| DOI | 10.6084/m9.figshare.5104873.v1 |
|---|---|
| Patent number | US07470691B2 |
| Source dataset | uspto-grants-2008_12 |
| ORD ID | ord-b9fcf3a6af18438bbcf762fcf7ff5df3 |
| Source note | uspto-grants-2008_12 |