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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 2379300Generated: October 26, 2026

Dichlorodimethylsilane → di(1H-inden-1-yl)dimethylsilane

https://huagongshe.com/reaction/2379300

Reaction equation

Participants

RoleNameHCIDCharge
ReactantDichlorodimethylsilaneHCID 6398—
ReactantIndeneHCID 7219—
ReactantButyllithiumHCID 178418339—
ReactantHCID 178506815HCID 178506815—
Productdi(1H-inden-1-yl)dimethylsilaneHCID 59942971%

Reaction Steps

In detail, in Japanese Patent Laid-Open Publication No. 221285/1990 for example, a solution of an indenyl lithium salt prepared from indene and n-butyllithium is slowly added to a dimethyldichlorosilane solution, and they are reacted with each other overnight to obtain dimethyldi(1-indenyl)silane in a 71% yield. In Japanese Patent Laid-Open Publication No. 268307/1992, dimethyldi (2-methyl-1-indenyl) silane is obtained in a 16% yield in a manner similar to the above.

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS05360921
Source datasetuspto-grants-1994_11
ORD IDord-ce9b78dae72b4ddc992262c705339d43
Source noteuspto-grants-1994_11