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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 2393989Generated: October 30, 2026

Chlorotrimethylsilane → HCID 54681395, compound

https://huagongshe.com/reaction/2393989

Reaction equation

Participants

RoleNameHCIDCharge
ReactantChlorotrimethylsilaneHCID 6397—
Reactant2'-HydroxyacetophenoneHCID 8375—
ReactantLithium HexamethyldisilazideHCID 2733832—
Reactant[(Phenylmethyl)thio]propanedioic acidHCID 19596125—
SolventTetrahydrofuranHCID 8028—
ProductHCID 54681395HCID 54681395—

Reaction Steps

The title compound was prepared by Method A using 2'-hydroxyacetophenone (0.722 g, 5.31 mmol), lithium bis(trimethylsilyl)amide (1.95 g, 11.6 mmol), chlorotrimethylsilane (1.48 mL, 11.6 mmol), THF (116 mL), and diethyl ester of [(phenylmethyl)thio]propanedioic acid (1.00 g, 3.54 mmol). m.p. dec. 189° C.; 1H NMR (400 MHz, DMSO-d6) δ 4.01 (s, 2 H), 6.97 (s, 1 H), 7.25 (m, 7 H), 7.71 (d, 1 H), 10.75 (s, 1 H), 11.85 (bs, 1 H).

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS05808062
Source datasetuspto-grants-1998_09
ORD IDord-cddd46234e1e4512bcbba3b10cc2349f
Source noteuspto-grants-1998_09