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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 2393993Generated: October 30, 2026

Chlorotrimethylsilane → HCID 54681332, compound

https://huagongshe.com/reaction/2393993

Reaction equation

Participants

RoleNameHCIDCharge
ReactantChlorotrimethylsilaneHCID 6397—
Reactant2',6'-DimethylacetophenoneHCID 16506—
ReactantLithium HexamethyldisilazideHCID 2733832—
Reactant[(Phenylmethyl)thio]propanedioic acidHCID 19596125—
SolventTetrahydrofuranHCID 8028—
ProductHCID 54681332HCID 54681332—

Reaction Steps

The title compound was prepared by Method A using 2',6'-dimethyl acetophenone (0.785 g, 5.31 mmol), lithium bis(trimethylsilyl)amide (0.977 g, 5.84 mmol), chlorotrimethylsilane (0.741 mL, 5.84 mmol), THF (58 mL), and diethyl ester of [(phenylmethyl)thio]propanedioic acid (1.00 g, 3.54 mmol). m.p. 140°-143° C.; 1H NMR (400 MHz, DMSO-d6) δ 2.15 (s, 6 H), 3.99 (s, 2 H), 6.12 (s, 1 H), 7.22 (m, 8H).

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS05808062
Source datasetuspto-grants-1998_09
ORD IDord-13805914201747099170bc51ba557177
Source noteuspto-grants-1998_09