HuagongsheHuagongshe Chemistry Print Report · For research reference only
Chlorotrimethylsilane → HCID 54681332, compound
Participants
| Role | Name | HCID | Charge |
|---|---|---|---|
| Reactant | Chlorotrimethylsilane | HCID 6397 | — |
| Reactant | 2',6'-Dimethylacetophenone | HCID 16506 | — |
| Reactant | Lithium Hexamethyldisilazide | HCID 2733832 | — |
| Reactant | [(Phenylmethyl)thio]propanedioic acid | HCID 19596125 | — |
| Solvent | Tetrahydrofuran | HCID 8028 | — |
| Product | HCID 54681332 | HCID 54681332 | — |
Reaction Steps
The title compound was prepared by Method A using 2',6'-dimethyl acetophenone (0.785 g, 5.31 mmol), lithium bis(trimethylsilyl)amide (0.977 g, 5.84 mmol), chlorotrimethylsilane (0.741 mL, 5.84 mmol), THF (58 mL), and diethyl ester of [(phenylmethyl)thio]propanedioic acid (1.00 g, 3.54 mmol). m.p. 140°-143° C.; 1H NMR (400 MHz, DMSO-d6) δ 2.15 (s, 6 H), 3.99 (s, 2 H), 6.12 (s, 1 H), 7.22 (m, 8H).
Provenance & Evidence
| DOI | 10.6084/m9.figshare.5104873.v1 |
|---|---|
| Patent number | US05808062 |
| Source dataset | uspto-grants-1998_09 |
| ORD ID | ord-13805914201747099170bc51ba557177 |
| Source note | uspto-grants-1998_09 |