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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 2394007Generated: October 31, 2026

Chlorotrimethylsilane → HCID 54718674, compound

https://huagongshe.com/reaction/2394007

Reaction equation

Participants

RoleNameHCIDCharge
ReactantChlorotrimethylsilaneHCID 6397—
ReactantHCID 569606HCID 569606—
ReactantLithium HexamethyldisilazideHCID 2733832—
Reactant[(Phenylmethyl)thio]propanedioic acidHCID 19596125—
SolventTetrahydrofuranHCID 8028—
ProductHCID 54718674HCID 54718674—

Reaction Steps

The title compound was prepared by Method A using 4'-benzoyloxyacetophenone (1.27 g, 5.31 mmol), lithium bis(trimethyl-silyl)amide (0.977 g, 5.84 mmol), chlorotrimethyl-silane (0.741 mL, 5.84 mmol), THF (58 mL), and diethyl ester of [(phenylmethyl)thio]propanedioic acid (1.00 g, 3.54 mmol). m.p. dec. 205° C.; 1H NMR (400 MHz, DMSO-d6) δ 4.01 (s, 2 H), 6.75 (s, 1 H), 7.21 (m, 1 H), 7.25 (d, 4 H), 7.47 (d, 2 H), 7.63 (t, 2 H), 7.77 (t, 1 H), 7.90 (d, 2 H), 8.16 (d, 2 H).

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS05808062
Source datasetuspto-grants-1998_09
ORD IDord-b749a6f482f74d10abd35d46e6453e6a
Source noteuspto-grants-1998_09