Back
HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 2394017Generated: October 29, 2026

Chlorotrimethylsilane → HCID 54681313, compound

https://huagongshe.com/reaction/2394017

Reaction equation

Participants

RoleNameHCIDCharge
ReactantChlorotrimethylsilaneHCID 6397—
ReactantLithium HexamethyldisilazideHCID 2733832—
ReactantHCID 13340058HCID 13340058—
Reactant[(Phenylethyl)thio]propanedioic acidHCID 19596072—
SolventTetrahydrofuranHCID 8028—
ProductHCID 54681313HCID 54681313—

Reaction Steps

The title compound was prepared by Method A using 4'-(cyclohexylmethoxy)acetophenone (2.50 g, 10.77 mmol), lithium bis(trimethylsilyl)amide (2.70 g, 16.16 mmol), chlorotrimethylsilane (2.05 mL, 16.16 mmol), THF (107 mL), and diethyl ester of [(2-phenylethyl)thio]propanedioic acid (1.00 g, 3.37 mmol). m.p. 130°-132° C.; 1H NMR (400 MHz, DMSO-d6) δ 1.15 (m, 5 H), 1.81 (m, 6 H), 2.77 (t, 2 H), 2.97 (t, 2 H), 3.85 (d, 2 H), 6.67 (s, 1 H), 7.21 (m, 5 H), 7.45 (q, 1 H), 7.74 (d, 2 H).

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS05808062
Source datasetuspto-grants-1998_09
ORD IDord-c5337ffd86fe479ba4f979fd016e7222
Source noteuspto-grants-1998_09