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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 2394018Generated: November 1, 2026

Chlorotrimethylsilane → HCID 54681429, compound

https://huagongshe.com/reaction/2394018

Reaction equation

Participants

RoleNameHCIDCharge
ReactantChlorotrimethylsilaneHCID 6397—
Reactant1-[4-(Benzenesulfonyl)phenyl]ethan-1-oneHCID 265878—
ReactantLithium HexamethyldisilazideHCID 2733832—
Reactant[(Phenylethyl)thio]propanedioic acidHCID 19596072—
SolventTetrahydrofuranHCID 8028—
ProductHCID 54681429HCID 54681429—

Reaction Steps

The title compound was prepared by Method A using 4'-(phenylsulfonyl)acetophenone (2.50 g, 9.61 mmol), lithium bis(trimethylsilyl)amide (2.41 g, 14.42 mmol), chlorotrimethylsilane (1.83 mL, 14.42 mmol), THF (96 mL), and diethyl ester of [(2-phenylethyl)thio]propanedioic acid (1.00 g, 3.37 mmol). m.p. 194°-195° C.; 1H NMR (400 MHz, DMSO-d6) δ 2.76 (t, 2 H), 3.01 (t, 2 H), 6.87 (s, 1 H), 7.19 (m, 5 H), 7.68 (m, 3 H), 8.04 (m, 6 H), 12.05 (bs, 1 H).

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS05808062
Source datasetuspto-grants-1998_09
ORD IDord-58fdc7fd98e34a54be161c7960f591f0
Source noteuspto-grants-1998_09