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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 2394020Generated: October 29, 2026

Chlorotrimethylsilane → HCID 54681481, compound

https://huagongshe.com/reaction/2394020

Reaction equation

Participants

RoleNameHCIDCharge
ReactantChlorotrimethylsilaneHCID 6397—
Reactant4-AcetylpyridineHCID 14282—
ReactantLithium HexamethyldisilazideHCID 2733832—
Reactant[(Phenylethyl)thio]propanedioic acidHCID 19596072—
SolventTetrahydrofuranHCID 8028—
ProductHCID 54681481HCID 54681481—

Reaction Steps

The title compound was prepared by Method A using 4-acetylpyridine (2.50 g, 20.63 mmol), lithium bis(trimethylsilyl)amide (5.17 g, 30.94 mmol), chlorotrimethylsilane (3.92 mL, 30.94 mmol), THF (200 mL), and diethyl ester of [(2-phenylethyl)thio]-propanedioic acid (1.00 g, 3.37 mmol). m.p. dec. 149°-152° C.; 1H NMR (400 MHz, DMSO-d6) δ 2.78 (t, 2 H), 3.04 (t, 2 H), 6.98 (s, 1 H), 7.20 (m, 5 H), 7.74 (d, 2 H), 8.74 (d, 2 H).

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS05808062
Source datasetuspto-grants-1998_09
ORD IDord-0bb816ff70114bcbbb5453e71f62257c
Source noteuspto-grants-1998_09