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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 2394022Generated: October 29, 2026

Chlorotrimethylsilane → HCID 54681194, compound

https://huagongshe.com/reaction/2394022

Reaction equation

Participants

RoleNameHCIDCharge
ReactantChlorotrimethylsilaneHCID 6397—
Reactant1-(4-Benzyloxy-3-methoxy-phenyl)-ethanoneHCID 99215—
ReactantLithium HexamethyldisilazideHCID 2733832—
Reactant[(Phenylethyl)thio]propanedioic acidHCID 19596072—
SolventTetrahydrofuranHCID 8028—
ProductHCID 54681194HCID 54681194—

Reaction Steps

The title compound was prepared by Method A using 4'-benzyloxy-3'-methoxyacetophenone (2.00 g, 7.81 mmol), lithium bis(trimethylsilyl)amide (1.96 g, 11.71 mmol), chlorotrimethylsilane (1.48 mL, 11.71 mmol), THF (80 mL), and diethyl ester of [(2-phenylethyl)thio]propanedioic acid (1.00 g, 3.37 mmol). m.p. 114°-115° C.; 1H NMR (400 MHz, DMSO-d6) δ 2.77 (t, 2 H), 2.98 (t, 2 H), 3.86 (s, 1 H), 6.75 (s, 1 H), 7.21 (m, 7 H), 7.40 (m, 6 H).

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS05808062
Source datasetuspto-grants-1998_09
ORD IDord-b3ff722b97a34b7fb27223a19bc0cce7
Source noteuspto-grants-1998_09