HuagongsheHuagongshe Chemistry Print Report · For research reference only
Chlorotrimethylsilane → HCID 54681194, compound
Participants
| Role | Name | HCID | Charge |
|---|---|---|---|
| Reactant | Chlorotrimethylsilane | HCID 6397 | — |
| Reactant | 1-(4-Benzyloxy-3-methoxy-phenyl)-ethanone | HCID 99215 | — |
| Reactant | Lithium Hexamethyldisilazide | HCID 2733832 | — |
| Reactant | [(Phenylethyl)thio]propanedioic acid | HCID 19596072 | — |
| Solvent | Tetrahydrofuran | HCID 8028 | — |
| Product | HCID 54681194 | HCID 54681194 | — |
Reaction Steps
The title compound was prepared by Method A using 4'-benzyloxy-3'-methoxyacetophenone (2.00 g, 7.81 mmol), lithium bis(trimethylsilyl)amide (1.96 g, 11.71 mmol), chlorotrimethylsilane (1.48 mL, 11.71 mmol), THF (80 mL), and diethyl ester of [(2-phenylethyl)thio]propanedioic acid (1.00 g, 3.37 mmol). m.p. 114°-115° C.; 1H NMR (400 MHz, DMSO-d6) δ 2.77 (t, 2 H), 2.98 (t, 2 H), 3.86 (s, 1 H), 6.75 (s, 1 H), 7.21 (m, 7 H), 7.40 (m, 6 H).
Provenance & Evidence
| DOI | 10.6084/m9.figshare.5104873.v1 |
|---|---|
| Patent number | US05808062 |
| Source dataset | uspto-grants-1998_09 |
| ORD ID | ord-b3ff722b97a34b7fb27223a19bc0cce7 |
| Source note | uspto-grants-1998_09 |