HuagongsheHuagongshe Chemistry Print Report · For research reference only
HCID 178477443, compound → HCID 178477444, compound
Participants
| Role | Name | HCID | Charge |
|---|---|---|---|
| Reactant | HCID 178477443 | HCID 178477443 | — |
| Solvent | Trifluoroacetic acid | HCID 6422 | — |
| Product | HCID 178477444 | HCID 178477444 | — |
Reaction Steps
A solution of 5.0 g of N2 -(6,7-dimethoxy-2-naphthalenesulfonyl)-L-arginyl-N-(2-ethylthioethyl)glycine tert-butyl ester in 10 ml of trifluoroacetic acid was stirred for 5 hours at room temperature. At the end of this period, the reaction mixture was evaporated to dryness. The residue was washed several times with dry diethyl ether and chromatographed on 80 ml of Daiaion SK 102 ion exchange resin (200-300 mesh, H+ form, manufactured by Mitsubishi Chemical Industries Limited) packed in water, washed with water and eluted with ethanol-H2O-NH4OH (5:4:1).
Provenance & Evidence
| DOI | 10.6084/m9.figshare.5104873.v1 |
|---|---|
| Patent number | US04018913 |
| Source dataset | uspto-grants-1977_04 |
| ORD ID | ord-0b72bac40efa444eac47e69c5fc30de4 |
| Source note | uspto-grants-1977_04 |