HuagongsheHuagongshe Chemistry Print Report · For research reference only
Triethylsilane → HCID 42601461, compound
Participants
| Role | Name | HCID | Charge |
|---|---|---|---|
| Reactant | Triethylsilane | HCID 12052 | — |
| Reactant | HCID 57695175 | HCID 57695175 | — |
| Product | HCID 42601461 | HCID 42601461 | 83.9% |
Reaction Steps
BA-01. A solution of compound (7) (32.5 mg, 0.066 mmol) was treated with Et3SiH (500 uL, 3 mmol, 47 eq.). The mixture was stirred at room temperature for 130 min. until starting material XM-17 was consumed. The volatile material was removed under reduced pressure. The residue was washed with sodium bicarbonate solution, extracted with EtOAc (3×15 mL), dried. Evaporation gave a residue, which was purified chromatography on silica gel using dichloromethane/hexanes (1:1, 2:1, 3:1, 4:1, 20 mL each) followed by dichloromethane as eluent to give 21 mg of product, which contained impurities. The product thus obtained was triturated with hexanes to give 7.6 mg of desired product. BA-01. 1H NMR. LCMS: 99%.
Provenance & Evidence
| DOI | 10.6084/m9.figshare.5104873.v1 |
|---|---|
| Patent number | US08883833B2 |
| Source dataset | uspto-grants-2014_11 |
| ORD ID | ord-58a52b3d71fc4110a99177201a36be38 |
| Source note | uspto-grants-2014_11 |