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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 334997Generated: October 31, 2026

Triethylsilane → HCID 42601461, compound

https://huagongshe.com/reaction/334997

Reaction equation

Participants

RoleNameHCIDCharge
ReactantTriethylsilaneHCID 12052—
ReactantHCID 57695175HCID 57695175—
ProductHCID 42601461HCID 4260146183.9%

Reaction Steps

BA-01. A solution of compound (7) (32.5 mg, 0.066 mmol) was treated with Et3SiH (500 uL, 3 mmol, 47 eq.). The mixture was stirred at room temperature for 130 min. until starting material XM-17 was consumed. The volatile material was removed under reduced pressure. The residue was washed with sodium bicarbonate solution, extracted with EtOAc (3×15 mL), dried. Evaporation gave a residue, which was purified chromatography on silica gel using dichloromethane/hexanes (1:1, 2:1, 3:1, 4:1, 20 mL each) followed by dichloromethane as eluent to give 21 mg of product, which contained impurities. The product thus obtained was triturated with hexanes to give 7.6 mg of desired product. BA-01. 1H NMR. LCMS: 99%.

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS08883833B2
Source datasetuspto-grants-2014_11
ORD IDord-58a52b3d71fc4110a99177201a36be38
Source noteuspto-grants-2014_11