Beteiligte Stoffe
| Rolle | Name | HCID | Einwaage |
|---|
| Edukt | Water | HCID 962 | — |
| Edukt | Azobisisobutyronitrile | HCID 6547 | — |
| Edukt | Methacryloxymethyltrimethylsilane | HCID 2760855 | — |
| Edukt | Tetrahydropyranyl methacrylate | HCID 11041138 | — |
| Lösungsmittel | Methanol | HCID 887 | — |
| Lösungsmittel | Toluene | HCID 1140 | — |
| Produkt | HCID 86753512 | HCID 86753512 | 90% |
Reaktionsschritte
Trimethylsilylmethyl methacrylate (TMSMMA) and tetrahydropyranyl methacrylate (THPMA) were mixed at a ratio of 1:1 so as to prepare a toluene solution having a monomer concentration of 5.0 mol/liter. Next, 2 mol %, on the basis of the monomer, of AIBN was added to the mixture, and the mixture was retained in an oil bath at 80° C. for 7 hours with stirring. Next, the mixture was left standing to cool to room temperature. After the mixture was diluted with toluene, it was dropped into large quantities of a mixed solvent of water and methanol having a mixing ratio of 1:20, and the resulting precipitate was filtered and dried to obtain a base polymer of a resist material. There was thus obtained a trimethylsilylmethyl methacrylate/tetrahydropyranyl methacrylate copolymer represented by the following formula, ##STR13## wherein each of m and n is a positive integer.
Herkunft & Nachweise
| DOI | 10.6084/m9.figshare.5104873.v1 |
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| Patentnummer | US05856071 |
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| Quelldatensatz | uspto-grants-1999_01 |
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| ORD ID | ord-93bf5aa2af9940449353ee994ac951e2 |
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| Quellennotiz | uspto-grants-1999_01 |
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