HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 362680Generated: October 30, 2026
Trichlorosilane → Nonafluorohexyltrichlorosilane
https://huagongshe.com/reaction/362680
Participants
| Role | Name | HCID | Charge |
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| Reactant | Trichlorosilane | HCID 24811 | — |
| Reactant | 3,3,4,4,5,5,6,6,6-Nonafluoro-1-hexene | HCID 88054 | — |
| Solvent | O-Xylene | HCID 7237 | — |
| Product | Nonafluorohexyltrichlorosilane | HCID 11811026 | 92% |
Reaction Steps
123 g (0.5 mol) of 3,3,4,4,5,5,6,6,6-nonafluorohexene and 76 g (0.5 mol) of trichlorosilane together with 0.34 g of CPC 072 (Pt(0)-divinyltetramethyldisiloxane in xylene; concentration Pt:3,3,4,4,5,5,6,6,6-nonafluorohexene=1:20,000) are charged to a 250 ml laboratory steel autoclave. The autoclave is closed and heated to 140° C. in an oil bath over 70 minutes. The exothermic reaction begins after about 8 minutes, the reaction mixture rising to 165° C. It is subsequently cooled, the reactor is emptied, and short-path distillation gives 176 g (0.46 mol) of 3,3,4,4,5,5,6,6,6-nonafluorohexyltrichlorosilane (yield: 90%, purity: >98 area % GC-TCD).
Provenance & Evidence
| DOI | 10.6084/m9.figshare.5104873.v1 |
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| Patent number | US05869728 |
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| Source dataset | uspto-grants-1999_02 |
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| ORD ID | ord-07ad0583edf445198a43619388cc663f |
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| Source note | uspto-grants-1999_02 |
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