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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 362680Generated: October 30, 2026

Trichlorosilane → Nonafluorohexyltrichlorosilane

https://huagongshe.com/reaction/362680

Reaction equation

Participants

RoleNameHCIDCharge
ReactantTrichlorosilaneHCID 24811—
Reactant3,3,4,4,5,5,6,6,6-Nonafluoro-1-hexeneHCID 88054—
SolventO-XyleneHCID 7237—
ProductNonafluorohexyltrichlorosilaneHCID 1181102692%

Reaction Conditions

Temperature140 °C

Reaction Steps

123 g (0.5 mol) of 3,3,4,4,5,5,6,6,6-nonafluorohexene and 76 g (0.5 mol) of trichlorosilane together with 0.34 g of CPC 072 (Pt(0)-divinyltetramethyldisiloxane in xylene; concentration Pt:3,3,4,4,5,5,6,6,6-nonafluorohexene=1:20,000) are charged to a 250 ml laboratory steel autoclave. The autoclave is closed and heated to 140° C. in an oil bath over 70 minutes. The exothermic reaction begins after about 8 minutes, the reaction mixture rising to 165° C. It is subsequently cooled, the reactor is emptied, and short-path distillation gives 176 g (0.46 mol) of 3,3,4,4,5,5,6,6,6-nonafluorohexyltrichlorosilane (yield: 90%, purity: >98 area % GC-TCD).

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS05869728
Source datasetuspto-grants-1999_02
ORD IDord-07ad0583edf445198a43619388cc663f
Source noteuspto-grants-1999_02