HuagongsheHuagongshe Chemistry Print Report · For research reference only
Chlorotrimethylsilane → 2-(Trimethylsilyl)-1,3-oxazole
Participants
| Role | Name | HCID | Charge |
|---|---|---|---|
| Reactant | Chlorotrimethylsilane | HCID 6397 | — |
| Reactant | Oxazole | HCID 9255 | — |
| Reactant | Butyllithium | HCID 178418339 | — |
| Solvent | Diethyl Ether | HCID 3283 | — |
| Solvent | Hexane | HCID 8058 | — |
| Product | 2-(Trimethylsilyl)-1,3-oxazole | HCID 14786621 | 50.1% |
Reaction Steps
n-Butyllithium (28.5 ml of a 2.54M solution in hexane) was added to a -78° solution of oxazole (5.0 g) in ether (150 ml). The resulting solution was stirred at -78° for 30 min, followed by the addition of trimethylsilyl chloride (7.86 g), and the mixture allowed to warm to room temperature. The reaction mixture was distilled and the fraction with a boiling point of about 130° was collected to afford 2-trimethylsilyl oxazole (5.12 g); MS, m/e=142(M+1), 91, 73.
Provenance & Evidence
| DOI | 10.6084/m9.figshare.5104873.v1 |
|---|---|
| Patent number | US05164371 |
| Source dataset | uspto-grants-1992_11 |
| ORD ID | ord-f4f3679e7afc402c9670274801d0f840 |
| Source note | uspto-grants-1992_11 |