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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 392775Generated: October 30, 2026

Trifluoroacetic acid → HCID 21638785, compound

https://huagongshe.com/reaction/392775

Reaction equation

Participants

RoleNameHCIDCharge
ReactantTrifluoroacetic acidHCID 6422—
ReactantHCID 55556362HCID 55556362—
SolventDichloromethaneHCID 6344—
ProductHCID 21638785HCID 2163878595.3%

Reaction Steps

The product from Step A (11 g) was suspended in CH2Cl2 (75 mL), and TFA was added dropwise (75 mL). The resulting solution was stirred overnight at ambient temperature. The reaction solution was concentrated under reduced pressure, and the resulting residue was dissolved in CH2Cl2 (100 mL). Saturated aqueous NaHCO3 (100 mL) was added slowly with stirring. After 20 min the organic layer was separated, washed with water (10 mL) and then brine (30 mL), and dried over Na2SO4. The organic layer was then concentrated under reduced pressure and purified via silica gel chromatography (0-35% methanol/dichloromethane) to give the title compound (7.6 g). MS (electrospray): exact mass calculated for C13H14ClN3O, 263.08; m/z found, 264.1 [M+H]+.

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS06803362B2
Source datasetuspto-grants-2004_10
ORD IDord-5498b006a54c47e89c1a1947b7302cf7
Source noteuspto-grants-2004_10