HRID399159

反应详情

EQUATION

反应方程式

HRID 399159 的结构方程式

AUXILIARIES

试剂、催化剂与溶剂

1

PROCEDURE

实验过程

Alternate Synthesis To a solution of 100 mg (0.30 mmol) of the acid 5-Hydroxy-2,2,4-trimethyl-7-pentyl-2H-1-benzopyran-3-propanoic acid in 15 mL of anhy. THF under argon and cooled in an ice-water bath was added 150 mg (3 eq) of carbonyldiimidazole (CDI) (Fluka Chem. Co.) as a solid in one lot. The reaction was stirred at ~0° C. for ~1 hr. The ice bath was removed and the stirred reaction allowed to warm up to RT over 1.5 hr. To the reaction was then added 345 mg (10 eq) of N-hydroxysuccinimide (NHS) (Aldrich) as a solid in one lot and the reaction stirred at RT under argon for 18 hrs. The reaction mixture was then evaporated under reduced pressure and the residue partitioned between 100 mL of EtOAc and 30 mL of 0.1N aq. HCl. The phases were separated and the organic layer washed with 0.1N HCl (2×30 mL), water (1×30 mL), 50 mM phosphate buffer pH 8 (3×30 mL), sat. aq. NaCi (1×30 mL), dried (Na2SO4), evaporated under reduced pressure and the residue dried under high vacuum. The residue was then subjected to PLC, eluting with 50% EtOAc-CH2Cl2. The upper product band was isolated and the silica washed with EtOAc. The washings were evaporated under reduced pressure and dried under high vacuum to give 44 mg of the desired product 1-[3-(5-Hydroxy-2,2,4-trimethyl-7-pentyl-2H-1-benzopyran-3-yl)-1-oxopropoxy]-2,5-pyrrolidinedione as a glass/amorphous solid.

WORKUP

后处理

  1. customThe ice bath was removed
  2. customthe stirred reaction
  3. stirringthe reaction stirred at RT under argon for 18 hrs
  4. customThe reaction mixture was then evaporated under reduced pressure
  5. customthe residue partitioned between 100 mL of EtOAc and 30 mL of 0.1N aq. HCl
  6. customThe phases were separated
  7. washthe organic layer washed with 0.1N HCl (2×30 mL), water (1×30 mL), 50 mM phosphate buffer pH 8 (3×30 mL), sat. aq. NaCi (1×30 mL)
  8. dry with materialdried (Na2SO4)
  9. customevaporated under reduced pressure
  10. customthe residue dried under high vacuum
  11. washeluting with 50% EtOAc-CH2Cl2
  12. customThe upper product band was isolated
  13. washthe silica washed with EtOAc
  14. customThe washings were evaporated under reduced pressure
  15. customdried under high vacuum