HuagongsheHuagongshe Chemistry Print Report · For research reference only
Trifluoroacetic acid → HCID 131722992, compound
Participants
| Role | Name | HCID | Charge |
|---|---|---|---|
| Reactant | Trifluoroacetic acid | HCID 6422 | — |
| Reactant | HCID 131722993 | HCID 131722993 | — |
| Solvent | Dichloromethane | HCID 6344 | — |
| Product | HCID 131722992 | HCID 131722992 | — |
Reaction Steps
1.2 g. of C11F23CONHC12H24NHCOO—(C2H4O)104-DMT were deprotected with 5% trifluoroacetic acid (TFA) in dichloromethane for 5 minutes. After evaporating the solvent the traces of TFA were carefully removed by washing with ether and gel-permeation chromatography on Toyopearl HW-40 at the conditions described in Part C to yield 0.6 g of product:
Provenance & Evidence
| DOI | 10.6084/m9.figshare.5104873.v1 |
|---|---|
| Patent number | US06316505B1 |
| Source dataset | uspto-grants-2001_11 |
| ORD ID | ord-15648caf43aa4a12a8b3547ccb78e96d |
| Source note | uspto-grants-2001_11 |