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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 446215Generated: October 27, 2026

Chlorotrimethylsilane → HCID 59270598, compound

https://huagongshe.com/reaction/446215

Reaction equation

Participants

RoleNameHCIDCharge
ReactantChlorotrimethylsilaneHCID 6397—
ReactantHexaneHCID 8058—
Reactant4-benzyl-N,N-diphenylanilineHCID 23399489—
ReactantButyllithiumHCID 178418339—
SolventTetrahydrofuranHCID 8028—
ProductHCID 59270598HCID 5927059884%

Reaction Steps

4-benzyl-N,N-diphenylaniline (5.0 g, 14.9 mmol) was dissolved in tetrahydrofuran (80 mL) under a nitrogen atmosphere. n-Butyllithium (10.3 mL, 16.4 mmol) was slowly added to the reaction solution at −78° C., and then the reaction mixture solution was stirred at room temperature for 1 hour. Also, the reaction mixture solution with chlorotrimethylsilane (1.8 g, 16.4 mmol) added thereto was stirred at room temperature for 1 hour. The reaction mixture solution was passed through a silica gel column by using hexane as an eluant. After the solvent is removed, the residue material was dried in vacuum to thereby a white solid (5.1 g, yield: 84%).

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS08476474B2
Source datasetuspto-grants-2013_07
ORD IDord-1d69b4af7e174f138d876dfe8dc606d9
Source noteuspto-grants-2013_07