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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 459697Generated: October 30, 2026

Chlorotrimethylsilane → HCID 555278, compound

https://huagongshe.com/reaction/459697

Reaction equation

Participants

RoleNameHCIDCharge
ReactantChlorotrimethylsilaneHCID 6397—
ReactantPentafluorophenolHCID 13041—
ReactantButyllithiumHCID 178418339—
SolventHexaneHCID 8058—
ProductHCID 555278HCID 55527860%

Reaction Steps

n-Butyllithium (9.75 mL, 22.39 mmol, 2.5 M in hexane) was added dropwise, at 0° C., to a 200 mL hexane solution of C6F5OH (4.08 g, 22.17 mmol). After the addition of n-butyllithium was complete, the reaction mixture was allowed to warm to room temperature. Chlorotrimethylsilane (2.65 g, 24.39 mmol) was added to the reaction at −40° C. After slowly warming to room temperature, the reaction was refluxed for 19 hours. Isolation of the crude product was achieved by ether extraction. The organic was washed with ammonium chloride, water, brine, and dried over sodium sulfate. Solvent was removed in vacuo to yield 4.0 g of crude product. The resulting liquid was purified by vacuum distillation to give 3.4 g (60%) of a colorless liquid. 1H NMR (C6D6): δ 0.081 (br. s).

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS07196032B2
Source datasetuspto-grants-2007_03
ORD IDord-80f5c6f0716c46e088090507d61a7e5e
Source noteuspto-grants-2007_03