HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 466590Generated: November 1, 2026
Chlorotrimethylsilane → HCID 53984494, compound
https://huagongshe.com/reaction/466590
Participants
| Role | Name | HCID | Charge |
|---|
| Reactant | Chlorotrimethylsilane | HCID 6397 | — |
| Reactant | Triethylamine | HCID 8471 | — |
| Reactant | HCID 19814509 | HCID 19814509 | — |
| Solvent | Benzene | HCID 241 | — |
| Product | HCID 53984494 | HCID 53984494 | 87% |
Reaction Steps
N-(2-Methoxy-5-pyridyl)formamide (30.4 g, 0.2 mol) was added to 200 ml benzene. This was stirred with a mechanical stirrer under argon at 10° C. Trimethylsilyl chloride (25 g, 0.23 mol) was added. While stirring at 10° C., triethylamine (21 g, 0.21 mol) dissolved in 50 ml benzene was added dropwise over 0.5 hour. The slurry was warmed to room temperature and after 0.5 hour filtered. The salt cake was washed with 100 ml benzene and the combined filtrates concentrated on a rotary evaporator at 30° C. under aspirator vacuum. The dark liquid product was distilled under reduced pressure. A clear liquid, 39 g, 87% yield, (b.p. 87° C./0.25 mmHg). The product was stored under argon.
Provenance & Evidence
| DOI | 10.6084/m9.figshare.5104873.v1 |
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| Patent number | US05157043 |
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| Source dataset | uspto-grants-1992_10 |
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| ORD ID | ord-0bff61b89b6d483d86bef7f2b936d5fd |
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| Source note | uspto-grants-1992_10 |
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