HuagongsheHuagongshe Chemistry Print Report · For research reference only
Methyl vinyl sulfone → HCID 76317949, compound
Participants
| Role | Name | HCID | Charge |
|---|---|---|---|
| Reactant | Methyl vinyl sulfone | HCID 19354 | — |
| Reactant | Diisopropylethylamine | HCID 81531 | — |
| Reactant | HCID 117598881 | HCID 117598881 | — |
| Solvent | Dichloromethane | HCID 6344 | — |
| Product | HCID 76317949 | HCID 76317949 | — |
Reaction Steps
To a solution of the product from Step 1, Example 236 (50 mg, 0.057 mmol) in CH2Cl2 (3 ml) was added DIPEA (0.030 ml, 0.171 mmol) followed by methyl vinyl sulfone (12.10 mg, 0.114 mmol). The reaction was stirred in a sealed vial for 16 h at which stage LCMS indicated complete conversion to one peak corresponding to a product with desired mass. After removing the solvent the crude mixture was purified by PTLC (5% MeOH in CH2Cl2) and then repurified by PTLC using 40% acetone in hexane to furnish the title compound. LRMS m/z 981.6 (M+H)+.
Provenance & Evidence
| DOI | 10.6084/m9.figshare.5104873.v1 |
|---|---|
| Patent number | US09328138B2 |
| Source dataset | uspto-grants-2016_05 |
| ORD ID | ord-d83ff7ca3e91405aad2ad06284845fba |
| Source note | uspto-grants-2016_05 |