HuagongsheHuagongshe Chemistry Print Report · For research reference only
Trifluoromethane → HCID 89157714, compound
Participants
| Role | Name | HCID | Charge |
|---|---|---|---|
| Reactant | Trifluoromethane | HCID 6373 | — |
| Reactant | Diethyldichlorosilane | HCID 15589 | — |
| Reactant | Potassium bis(trimethylsilyl)amide | HCID 3251421 | — |
| Product | HCID 89157714 | HCID 89157714 | 44% |
Reaction Steps
A similar procedure to the one reported in EXAMPLE 2 was followed except dichlorodiethylsilane (5.12 g, 32.5 mmol, 1 eq) was used as the substrate along with 2eq each of CF3H and KHMDS to obtain pure diethyl bis(trifluoromethyl)silane 3.2 g, 44% yield. 1H NMR (400 MHz): δ 1.08 (m, CH2), 1.16 (m, CH3); 13C NMR (100.5 MHz): δ-1.10 (s, CH2), 5.55 (s, CH3), 128.6 (qq, 1JC—F=319 Hz, 3.35 Hz, CF3); 19F NMR (376.3 MHz): δ-60.2 (s); 29Si NMR (79.5 MHz): δ-2.43 (sept, 2JSi—F=39.4 Hz, 1 Si).
Provenance & Evidence
| DOI | 10.6084/m9.figshare.5104873.v1 |
|---|---|
| Patent number | US09334253B2 |
| Source dataset | uspto-grants-2016_05 |
| ORD ID | ord-91a391a409d645d0944cba77728e9673 |
| Source note | uspto-grants-2016_05 |