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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 536772Generated: October 29, 2026

Trifluoroacetic acid → HCID 178448744, compound

https://huagongshe.com/reaction/536772

Reaction equation

Participants

RoleNameHCIDCharge
ReactantTrifluoroacetic acidHCID 6422—
ReactantHCID 178448745HCID 178448745—
SolventDichloromethaneHCID 6344—
ProductHCID 178448744HCID 17844874460.9%

Reaction Steps

A solution of Example 205B (120 mg, 0.19 mmol) in CH2Cl2 (5 mL) was treated with trifluoroacetic acid (0.15 mL, 1.9 mmol) at room temperature for 3 hours. The mixture was then concentrated under reduced pressure. The residue was treated with saturated aqueous NaHCO3 and extracted with EtOAc. The ethyl acetate layer was washed with water, brine, dried with anhydrous MgSO4, filtered, and concentrated under reduced pressure. The residue was purified by silica gel chromatography and eluted with 1:1 hexanes-Et2O to afford 60 mg of the title compound. 1H NMR (300 MHz, DMSO-d6) δ ppm 0.95 (t, J=7.5 Hz, 3H), 1.29-1.48 (m, 11H), 1.77-1.96 (m, 2H), 2.43-2.56 (m, 3H), 4.46 (t, J=7.3 Hz, 2H), 7.23 (d, J=6.8 Hz, 1H), 7.65-8.00 (m, 4H), 8.15 (s, 1H), 8.59 (d, J=1.7 Hz, 1H), 12.29 (s, 1H); MS (ESI+) m/z 519 (M+H)+.

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS08859596B2
Source datasetuspto-grants-2014_10
ORD IDord-958bfe18505a4d8aad2f41b0fa8a6ac4
Source noteuspto-grants-2014_10