HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 536772Generated: October 29, 2026
Trifluoroacetic acid → HCID 178448744, compound
https://huagongshe.com/reaction/536772
Participants
| Role | Name | HCID | Charge |
|---|
| Reactant | Trifluoroacetic acid | HCID 6422 | — |
| Reactant | HCID 178448745 | HCID 178448745 | — |
| Solvent | Dichloromethane | HCID 6344 | — |
| Product | HCID 178448744 | HCID 178448744 | 60.9% |
Reaction Steps
A solution of Example 205B (120 mg, 0.19 mmol) in CH2Cl2 (5 mL) was treated with trifluoroacetic acid (0.15 mL, 1.9 mmol) at room temperature for 3 hours. The mixture was then concentrated under reduced pressure. The residue was treated with saturated aqueous NaHCO3 and extracted with EtOAc. The ethyl acetate layer was washed with water, brine, dried with anhydrous MgSO4, filtered, and concentrated under reduced pressure. The residue was purified by silica gel chromatography and eluted with 1:1 hexanes-Et2O to afford 60 mg of the title compound. 1H NMR (300 MHz, DMSO-d6) δ ppm 0.95 (t, J=7.5 Hz, 3H), 1.29-1.48 (m, 11H), 1.77-1.96 (m, 2H), 2.43-2.56 (m, 3H), 4.46 (t, J=7.3 Hz, 2H), 7.23 (d, J=6.8 Hz, 1H), 7.65-8.00 (m, 4H), 8.15 (s, 1H), 8.59 (d, J=1.7 Hz, 1H), 12.29 (s, 1H); MS (ESI+) m/z 519 (M+H)+.
Provenance & Evidence
| DOI | 10.6084/m9.figshare.5104873.v1 |
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| Patent number | US08859596B2 |
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| Source dataset | uspto-grants-2014_10 |
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| ORD ID | ord-958bfe18505a4d8aad2f41b0fa8a6ac4 |
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| Source note | uspto-grants-2014_10 |
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