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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 556127Generated: October 31, 2026

Tetraethoxysilane → HCID 57894271, compound

https://huagongshe.com/reaction/556127

Reaction equation

Participants

RoleNameHCIDCharge
ReactantTetraethoxysilaneHCID 6517—
ReactantTetrahydrofuranHCID 8028—
Reactantp-DiiodobenzeneHCID 12208—
ReactantHCID 178418918HCID 178418918—
SolventDiethyl EtherHCID 3283—
ProductHCID 57894271HCID 5789427161.1%

Reaction Steps

Firstly, 2-M i-PrMgCl (24 mL (solvent: THF, 48 mmol) was added dropwise to a mixture of 1,4-diiodobenzene (15 g, 45.6 mmol) and dist. THF (114 mL) at −30° C. Then the resultant mixture was stirred under a nitrogen atmosphere at −30° C. for 5.5 hours to obtain a reaction solution. Subsequently, the reaction solution was added dropwise (3 drops/second) using a cannular into a mixture of tetraethoxysilane (TEOS: 60.6 mL, 272 mmol) and dist. THF (90 mL), which was cooled to −30° C. The resultant mixture was stirred at −30° C. for 1 hour, and then was stirred at room temperature for 44 hours to obtain a reaction mixed solution. Thereafter, the obtained reaction mixed solution was added with ether (100 mL), and then was washed with distilled water (dist. H2O). After that, an aqueous layer was extracted with ether. Then, an organic layer thus collected was washed with sat. NaCl, and was dried with MgSO4. The dried organic layer was filtered and concentrated to obtain a crude product. Subsequently, the obtained crude product was purified by a reduced-pressure distillation process (1.5 mmHg, 120° C.) to obtain 4-(triethoxysilyl)iodobenzene (10.2 g, 61% yield).

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS08053588B2
Source datasetuspto-grants-2011_11
ORD IDord-d372bd8f905040bb943eebc8c74eef1c
Source noteuspto-grants-2011_11