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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 556687Generated: October 31, 2026

Trifluoroacetic acid → HCID 178490674, compound

https://huagongshe.com/reaction/556687

Reaction equation

Participants

RoleNameHCIDCharge
ReactantTrifluoroacetic acidHCID 6422—
ReactantHCID 178490675HCID 178490675—
SolventDichloromethaneHCID 6344—
ProductHCID 178490674HCID 17849067468%

Reaction Steps

A solution of Example 15B (295 mg, 0.6 mmol) in CH2Cl2 (5 mL) was treated with trifluoroacetic acid (1 mL) and the reaction mixture was stirred at room temperature for 48 hrs, concentrated on the rotovap and the residue was partitioned between ethyl acetate and saturated NaHCO3. The organic layer was washed with brine, dried (MgSO4), filtered, and concentrated in vacuo. The residue was purified by flash chromatography using an Analogix® Intelliflash280™ (SiO2, 0-15% methanol in CH2Cl2) to afford the title compound (160 mg, 68% yield). MS (DCI) m/z 394 (M+H)+. 1H NMR (300 MHz, DMSO-d6) δ ppm 1.17-1.27 (m, 2H), 1.28-1.35 (s, 9H), 2.05-2.19 (m, 1H), 2.19-2.34 (m, 1H), 3.45-3.61 (m, 1H), 3.72-3.82 (m, 3H), 4.20-4.35 (m, 3H), 7.11 (d, J=8.7 Hz, 1H), 7.30 (s, 1H), 7.45 (dd, J=8.7, 2.8 Hz, 1H), 7.61 (d, J=2.8 Hz, 1H). MS (DCI) m/z 394 (M+H)+.

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS08058293B2
Source datasetuspto-grants-2011_11
ORD IDord-c4086bb97dcd4fc2aeb0b74b30430cd9
Source noteuspto-grants-2011_11