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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 571739Generated: October 29, 2026

Trifluoroacetic acid → HCID 117738858, compound

https://huagongshe.com/reaction/571739

Reaction equation

Participants

RoleNameHCIDCharge
ReactantTrifluoroacetic acidHCID 6422—
ReactantTriethylamineHCID 8471—
ReactantBenzoyl isothiocyanateHCID 68284—
ReactantThioureaHCID 2723790—
ReactantHCID 117738639HCID 117738639—
SolventDichloromethaneHCID 6344—
ProductHCID 117738858HCID 11773885883%

Reaction Steps

Scheme 2, step I, (deprotection and thiourea formation): A solution of tert-butyl N-[(3S,4S)-3-(5-acetamido-2-fluoro-phenyl)-4-fluoro-4-(hydroxymethyl)tetrahydrofuran-3-yl]carbamate (2.70 g, 6.99 mmol) in dichloromethane (40 mL) and trifluoroacetic acid (8.00 mL, 106 mmol) is stirred at ambient temperature for 150 minutes. The reaction is concentrated under reduced pressure and azeotroped with toluene. The residue is dissolved in tetrahydrofuran and treated with triethylamine (1.10 mL, 7.89 mmol) and benzoyl isothiocyanate (1.00 mL, 7.41 mmol). The reaction is stirred at ambient temperature for 16.5 hours and is then quenched with a solution of saturated sodium bicarbonate in water, extracted with ethyl acetate and dichloromethane consecutively. The organic layers are combined, dried over magnesium sulfate, filtered, and concentrated under reduced pressure to give a residue. The residue is purified by silica gel flash chromatography, eluting with methanol/dichloromethane (0:10) to methanol/dichloromethane (1:10) to give the title compound (2.60 g, 83%). ES/MS (m/e): 450 (M+1).

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS09029367B2
Source datasetuspto-grants-2015_05
ORD IDord-796cbfbe629549f9b6884820e137cfed
Source noteuspto-grants-2015_05