HuagongsheHuagongshe Chemistry Print Report · For research reference only
Triethoxychlorosilane → Trifluorovinyl triethoxysilane
Participants
| Role | Name | HCID | Charge |
|---|---|---|---|
| Reactant | Triethoxychlorosilane | HCID 78398 | — |
| Reactant | HCID 178506809 | HCID 178506809 | — |
| Solvent | Diethyl Ether | HCID 3283 | — |
| Product | Trifluorovinyl triethoxysilane | HCID 21864279 | — |
Reaction Steps
30.80 g (0.155 mol) ClSi(OEt)3 in Et2O is slowly added to solution of CF2═CF—Li (0.155 mol 13.633 g, prepared in situ) in Et2O at −78° C. Reaction mixture is stirred overnight while it will slowly warm to room temperature. LiCl is removed by filtration and the product, trifluorovinyltriethoxysilane, is isolated by distillation.
Provenance & Evidence
| DOI | 10.6084/m9.figshare.5104873.v1 |
|---|---|
| Patent number | US06924384B2 |
| Source dataset | uspto-grants-2005_08 |
| ORD ID | ord-0bf89f27f3a94d0c91f8a2f97b014674 |
| Source note | uspto-grants-2005_08 |