Hexachlorodisilane → Hexakis(dimethylamino) disilane

Participants

Role	Name	HCID	Charge
Reactant	Hexachlorodisilane	HCID 83497	—
Reactant	Lithium N-methylmethanaminide	HCID 5152226	—
Reactant	(2S,3S)-2-[4-[(1R)-1-amino-2-hydroxyethyl]triazol-1-yl]-1-[4-[4-[4-[(2S,3S)-2-[4-[(1R)-1-amino-2-hydroxyethyl]triazol-1-yl]-3-methylpentanoyl]piperazin-1-yl]-6-[2-[2-(2-prop-2-ynoxyethoxy)ethoxy]ethylamino]-1,3,5-triazin-2-yl]piperazin-1-yl]-3-methylpentan-1-one;hydrochloride	HCID 16745346	—
Reactant	Pentakis(dimethylamino) chloro disilane	HCID 86638304	—
Solvent	Hexane	HCID 8058	—
Product	Hexakis(dimethylamino) disilane	HCID 22053281	—

Reaction Conditions

Temperature	0 °C

Reaction Steps

The synthesis of ClSi2(NMe2)5 has been done from the ammonolysis of hexachlorodisilane and lithium dimethylamide. Hexachlorodisilane (HCD) is used as the starting material so that the Si-Si direct bond remains in the molecule. n-hexane is used as a solvent and cooled at 0° C. A mixture of pentakis(dimethylamino) chloro disilane and hexakis(dimethylamino) disilane is obtained. Lithium dimethylamide is added to form a “lithium dimethylamide solution”. HCD is added dropwise in the 0° C. lithium dimethylamide solution. Then the solution is stirred for 2 h at 0° C. then for 15 h at RT. The salt LiCl is then removed from the solution, and the n-hexane removed in vacuo. The resulting ClSi2(NMe2)5 and other byproducts are separated by fractional distillation.

Provenance & Evidence

DOI	10.6084/m9.figshare.5104873.v1
Patent number	USRE045839E1
Source dataset	uspto-grants-2016_01
ORD ID	ord-986f706d2cac4e8484b80cd0e5f04c23
Source note	uspto-grants-2016_01