HuagongsheHuagongshe Chemistry Print Report · For research reference only
Chlorotrimethylsilane → HCID 54681229, compound
Participants
| Role | Name | HCID | Charge |
|---|---|---|---|
| Reactant | Chlorotrimethylsilane | HCID 6397 | — |
| Reactant | Ethanone, 1-(2,4,6-trimethylphenyl)- | HCID 15461 | — |
| Reactant | Lithium Hexamethyldisilazide | HCID 2733832 | — |
| Reactant | [(Phenylmethyl)thio]propanedioic acid | HCID 19596125 | — |
| Solvent | Tetrahydrofuran | HCID 8028 | — |
| Product | HCID 54681229 | HCID 54681229 | — |
Reaction Steps
The title compound was prepared by Method A using 2',4',6'-trimethylacetophenone (1.86 g, 11.5 mmol), lithium bis(trimethylsilyl)amide (2.11 g, 12.65 mmol), chlorotrimethylsilane (1.60 mL, 12.65 mmol), THF (127 mL), and diethyl ester of [(phenylmethyl)thio]propanedioic acid (2.95 g, 10.4 mmol). m.p. 134-136° C.; 1H NMR (250 MHz, DMSO-d6) δ2.11 (s, 6 H), 2.26 (s, 3 H), 3.98 (s, 2 H), 6.03 (s, 1 H), 6.96 (s, 2 H), 7.25 (m, 5 H), 11.85 (bs, 1 H).
Provenance & Evidence
| DOI | 10.6084/m9.figshare.5104873.v1 |
|---|---|
| Patent number | US06005103 |
| Source dataset | uspto-grants-1999_12 |
| ORD ID | ord-40db09705d694b0895c51cdf2a5b52b9 |
| Source note | uspto-grants-1999_12 |