HuagongsheHuagongshe Chemistry Print Report · For research reference only
Chlorotrimethylsilane → HCID 54718674, compound
Participants
| Role | Name | HCID | Charge |
|---|---|---|---|
| Reactant | Chlorotrimethylsilane | HCID 6397 | — |
| Reactant | HCID 569606 | HCID 569606 | — |
| Reactant | Lithium Hexamethyldisilazide | HCID 2733832 | — |
| Reactant | [(Phenylmethyl)thio]propanedioic acid | HCID 19596125 | — |
| Solvent | Tetrahydrofuran | HCID 8028 | — |
| Product | HCID 54718674 | HCID 54718674 | — |
Reaction Steps
The title compound was prepared by Method A using 4'-benzoyloxyacetophenone (1.27 g, 5.31 mmol), lithium bis(trimethyl-silyl)amide (0.977 g, 5.84 mmol), chlorotrimethyl-silane (0.741 mL, 5.84 mmol), THF (58 mL), and diethyl ester of [(phenylmethyl)thio]propanedioic acid (1.00 g, 3.54. mmol). m.p. dec. 205° C.; 1H NMR (400 MHz, DMSO-d6) δ4.01 (s, 2 H), 6.75 (s, 1 H), 7.21 (m, 1 H), 7.25 (d, 4 H), 7.47 (d, 2 H), 7.63 (t, 2 H), 7.77 (t, 1 H), 7.90 (d, 2 H), 8.16 (d, 2 H).
Provenance & Evidence
| DOI | 10.6084/m9.figshare.5104873.v1 |
|---|---|
| Patent number | US06005103 |
| Source dataset | uspto-grants-1999_12 |
| ORD ID | ord-7f8e11c89262473cabd6e4710eacab01 |
| Source note | uspto-grants-1999_12 |