HuagongsheHuagongshe Chemistry Print Report · For research reference only
Chlorotrimethylsilane → HCID 54681429, compound
Participants
| Role | Name | HCID | Charge |
|---|---|---|---|
| Reactant | Chlorotrimethylsilane | HCID 6397 | — |
| Reactant | 1-[4-(Benzenesulfonyl)phenyl]ethan-1-one | HCID 265878 | — |
| Reactant | Lithium Hexamethyldisilazide | HCID 2733832 | — |
| Reactant | [(Phenylethyl)thio]propanedioic acid | HCID 19596072 | — |
| Solvent | Tetrahydrofuran | HCID 8028 | — |
| Product | HCID 54681429 | HCID 54681429 | — |
Reaction Steps
The title compound was prepared by Method A using 4'-(phenylsulfonyl)acetophenone (2.50 g, 9.61 mmol), lithium bis(trimethylsilyl)amide (2.41 g, 14.42 mmol), chlorotrimethylsilane (1.83 mL, 14.42 mmol), THF (96 mL), and diethyl ester of [(2-phenylethyl)thio]propanedioic acid (1.00 g, 3.37 mmol). m.p. 194-195° C.; 1H NMR (400 MHz, DMSO-d6) δ2.76 (t, 2 H), 3.01 (t, 2 H), 6.87 (s, 1 H), 7.19 (m, 5 H), 7.68 (m, 3 H), 8.04 (m, 6 H), 12.05 (bs, 1 H).
Provenance & Evidence
| DOI | 10.6084/m9.figshare.5104873.v1 |
|---|---|
| Patent number | US06005103 |
| Source dataset | uspto-grants-1999_12 |
| ORD ID | ord-7e13533da38f4378800f2c718f10a7d9 |
| Source note | uspto-grants-1999_12 |