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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 613100Generated: October 30, 2026

Chlorotrimethylsilane → HCID 54681500, compound

https://huagongshe.com/reaction/613100

Reaction equation

Participants

RoleNameHCIDCharge
ReactantChlorotrimethylsilaneHCID 6397—
Reactant1-(3,5-Dimethylphenyl)ethan-1-oneHCID 14921—
ReactantLithium diisopropylamideHCID 2724682—
Reactant[(Phenylethyl)thio]propanedioic acidHCID 19596072—
SolventTetrahydrofuranHCID 8028—
ProductHCID 54681500HCID 54681500—

Reaction Steps

The title compound was prepared by Method A using 3',5'-dimethyl acetophenone (1.75 g, 11.82 mmol), lithium diisopropylamide (1.89 g, 17.73 mmol), chlorotrimethylsilane (2.25 mL, 17.73 mmol), THF (120 mL), and diethyl ester of [(2-phenylethyl)thio]-propanedioic acid (1.00 g, 3.37 mmol). m.p. 155-157° C.; 1H NMR (400 MHz, DMSO-d6) δ2.34 (s, 6 H), 2.77 (t, 2 H), 2.99 (t, 2 H), 6.72 (s, 1 H), 7.21 (m, 6 H), 7.41 (s, 2 H), 8.74 (d, 2 H).

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS06005103
Source datasetuspto-grants-1999_12
ORD IDord-deec51da2eb9449e8b0030d22efda451
Source noteuspto-grants-1999_12