HuagongsheHuagongshe Chemistry Print Report · For research reference only
Chlorotrimethylsilane → HCID 54681500, compound
Participants
| Role | Name | HCID | Charge |
|---|---|---|---|
| Reactant | Chlorotrimethylsilane | HCID 6397 | — |
| Reactant | 1-(3,5-Dimethylphenyl)ethan-1-one | HCID 14921 | — |
| Reactant | Lithium diisopropylamide | HCID 2724682 | — |
| Reactant | [(Phenylethyl)thio]propanedioic acid | HCID 19596072 | — |
| Solvent | Tetrahydrofuran | HCID 8028 | — |
| Product | HCID 54681500 | HCID 54681500 | — |
Reaction Steps
The title compound was prepared by Method A using 3',5'-dimethyl acetophenone (1.75 g, 11.82 mmol), lithium diisopropylamide (1.89 g, 17.73 mmol), chlorotrimethylsilane (2.25 mL, 17.73 mmol), THF (120 mL), and diethyl ester of [(2-phenylethyl)thio]-propanedioic acid (1.00 g, 3.37 mmol). m.p. 155-157° C.; 1H NMR (400 MHz, DMSO-d6) δ2.34 (s, 6 H), 2.77 (t, 2 H), 2.99 (t, 2 H), 6.72 (s, 1 H), 7.21 (m, 6 H), 7.41 (s, 2 H), 8.74 (d, 2 H).
Provenance & Evidence
| DOI | 10.6084/m9.figshare.5104873.v1 |
|---|---|
| Patent number | US06005103 |
| Source dataset | uspto-grants-1999_12 |
| ORD ID | ord-deec51da2eb9449e8b0030d22efda451 |
| Source note | uspto-grants-1999_12 |