HuagongsheHuagongshe Chemistry Print Report · For research reference only
Chlorotrimethylsilane → HCID 54711484, compound
Participants
| Role | Name | HCID | Charge |
|---|---|---|---|
| Reactant | Chlorotrimethylsilane | HCID 6397 | — |
| Reactant | Potassium Bromide | HCID 253877 | — |
| Reactant | Lithium | HCID 3028194 | — |
| Reactant | HCID 19596124 | HCID 19596124 | — |
| Reactant | [(Phenylmethyl)thio]propanedioic acid | HCID 19596125 | — |
| Reactant | (Trimethylsilyl)amide | HCID 53627528 | — |
| Product | HCID 54711484 | HCID 54711484 | — |
Reaction Steps
The title compound was prepared by Method A using 1,4-benzodioxin-6-yl methyl ketone (2.5 g, 14.25 mmol), lithium bis(trimethylsilylamide (2.35 g, 14.25 mmol), chlorotrimethylsilane (2.47 g, 14.25 mmol) and diethyl ester of [(phenylmethyl)thio]propanedioic acid (1.00 g, 3.55 mmol). m.p. 192-193° C.; 1H NMR (400 MHz, DMSO-d6) δ3.99 (s, 2 H), 4.17 (m, 4 H), 6.8 (s, 1 H), 7.0 (d, 1 H), 7.2 (m, 1 H), 2.28 (m, 7 H); IR (KBr) 3435, 2924, 1649, 1624, 1508, 1288, 1066, 698 cm-1 ; MS (CI): m/e 369 (M+H,), 277 (12), 233 (12), 163 (9), 107 (10), 91 (76); Analysis calc'd for C20H16O5S1 : C, 65.21; H, 4.38; found: C, 64.80; H, 4.17.
Provenance & Evidence
| DOI | 10.6084/m9.figshare.5104873.v1 |
|---|---|
| Patent number | US06005103 |
| Source dataset | uspto-grants-1999_12 |
| ORD ID | ord-dd4d3c8ae51f436dafed681e80fcf6b0 |
| Source note | uspto-grants-1999_12 |