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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 613108Generated: October 29, 2026

Chlorotrimethylsilane → HCID 54681348, compound

https://huagongshe.com/reaction/613108

Reaction equation

Participants

RoleNameHCIDCharge
ReactantChlorotrimethylsilaneHCID 6397—
ReactantBenzenesulfonamideHCID 7370—
ReactantPotassium BromideHCID 253877—
ReactantLithiumHCID 3028194—
Reactant[(Phenylethyl)thio]propanedioic acidHCID 19596072—
Reactant(Trimethylsilyl)amideHCID 53627528—
SolventWaterHCID 962—
ProductHCID 54681348HCID 54681348—

Reaction Steps

The title compound was prepared by Method A using the corresponding benzenesulfonamide (3.0 g, 10.91 mmol), lithium bis(trimethylsilylamide (3.65 g, 21.82 mmol), chlorotrimethylsilane (3.68 mL, 21.82 mmol) and diethyl ester of [(phenylethyl)thio]propanedioic acid (1.00 g, 3.37 mmol). m.p. 89-91° C.; 1H NMR (400 MHz, DMSO-d6) δ2.78 (t, 2 H), 3.03 (t, 2 H), 6.86 (s, 1 H), 7.25 (m, 6 H), 7.72 (t, 3 H), 7.86 (m, 5 H); IR (KBr) 3443, 3335, 1725, 1632, 1543, 1383, 1171, 912, 729, 581, 552 cm-1 ; Analysis calc'd for C25H21N1S2O5. H2O: C, 60.35; H, 4.66; N, 2.81; found: C, 60.13; H, 4.47; N, 3.23.

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS06005103
Source datasetuspto-grants-1999_12
ORD IDord-0f264735681e468c8878b4cec622c8c2
Source noteuspto-grants-1999_12