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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 613111Generated: October 29, 2026

Chlorotrimethylsilane → HCID 54737113, compound

https://huagongshe.com/reaction/613111

Reaction equation

Participants

RoleNameHCIDCharge
ReactantChlorotrimethylsilaneHCID 6397—
ReactantPotassium BromideHCID 253877—
ReactantHCID 925838HCID 925838—
ReactantLithium HexamethyldisilazideHCID 2733832—
Reactant[(Phenylethyl)thio]propanedioic acidHCID 19596072—
ProductHCID 54737113HCID 54737113—

Reaction Steps

The title compound was prepared by Method A using 4-[[(4-acetyl) phenoxy]methyl]benzoic acid methyl ester (2.0 g, 7.04 mmol), lithium hexamethyldisilazide (2.36 g, 14.08 mmol), chlorotrimethylsilane (2.38 g, 14.08 mmol) and diethyl ester of [(2-phenylethyl) thio]propanedioic acid (1.0 g, 3.05 mmol). m.p. 157-158° C.; 1H NMR (400 MHz, DMSO-d6) δ2.78 (t, 2 H), 2.97 (t, 2 H), 3.86 (s, 2 H), 5.31 (s, 2 H), 6.67 (s, 1 H), 7.17 (q, 4 H), 7.25 (m, 3 H), 7.61 (d, 2 H), 7.78 (d, 2H), 8.0 (d, 2H); IR (KBr) 3023, 2936, 2581, 1632, 1510, 1404, 1258, 1184, 1098, 1009, 818, 718 cm-1 ; MS (CI) m/e 517 (M+29, 7), 489 (M+H, 55), 384 (19), 149 (40), 105 (100).

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS06005103
Source datasetuspto-grants-1999_12
ORD IDord-51146379fada40c893fabb3049fbc71c
Source noteuspto-grants-1999_12