HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 635128Generated: October 30, 2026
Hydrochloric Acid → (2R,3S,4R,5R)-2,3,4,5,6-pentahydroxyhexanal
https://huagongshe.com/reaction/635128
Participants
| Role | Name | HCID | Charge |
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| Reactant | Hydrochloric Acid | HCID 313 | — |
| Reactant | Water | HCID 962 | — |
| Reactant | (3-Aminopropyl)triethoxysilane | HCID 13521 | — |
| Product | (2R,3S,4R,5R)-2,3,4,5,6-pentahydroxyhexanal | HCID 107526 | — |
Reaction Steps
The three wafers with porous silicon and a wafer of polished silicon introduced for comparative purposes were silanised in a cup containing 3-aminopropyltriethoxysilane (Sigma Chemical Co, St Louis, US) and 1 g of APTES in 9 ml of water, the pH value being adjusted to 3.5 with the aid of 6 M HCl. The silanisation was performed in a water bath at 75° C. for 3 h and was followed by abundant washing with water for 30 min. Careful agitation took place during each stage of the immobilisation process. Then, the wafers were placed in a solution of 2.5% glutaraldehyde (GA) (grade II, Sigma Chemical Co, St Louis, US) in 0.1 M phosphate buffer (PBS) for 2 h. The GA activation was followed by washing with PBS for 30 min. Finally, glucose oxidase (GOD) was associated with the wafers as a result of a treatment with 10 mg of glucose oxidase (EC 1.1.3.4, type X-S, Aspergillus niger) in 2 ml of PBS overnight (8 h), which was followed by washing in PBS for 1 h.
Provenance & Evidence
| DOI | 10.6084/m9.figshare.5104873.v1 |
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| Patent number | US06187446B1 |
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| Source dataset | uspto-grants-2001_02 |
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| ORD ID | ord-6270f34f192341368a3e249df1aed11e |
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| Source note | uspto-grants-2001_02 |
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