Bicyclo[2.2.1]hept-5-ene-2-carboxylic acid, 1,1-dimethylethyl ester → HCID 131723175, compound
Reaction equation
[CH:1]12[CH2:7][CH:4]([CH:5]=[CH:6]1)[CH2:3][CH:2]2[C:8]([O:10][CH:11]1[CH2:16][CH2:15][CH2:14][CH2:13][O:12]1)=[O:9].[CH:17]12[CH2:23][CH:20]([CH:21]=[CH:22]1)[CH2:19][CH:18]2[C:24]([O:26][C:27]([CH3:30])(C)C)=[O:25]>>[CH:1]12[CH2:7][CH:4]([CH:5]=[CH:6]1)[CH2:3][CH:2]2[C:8]([O:10][CH:11]1[CH2:16][CH2:15][CH2:14][CH2:13][O:12]1)=[O:9].[CH:17]12[CH2:23][CH:20]([CH:21]=[CH:22]1)[CH2:19][CH:18]2[C:24]([O:26][CH2:27][CH2:30][OH:9])=[O:25].[CH3:11][O:10][C:8]([CH:2]1[CH:3]([C:24]([OH:26])=[O:25])[CH:4]2[CH:5]=[CH:6][CH:1]1[CH2:7]2)=[O:9].[C:8]1(=[O:9])[O:10][C:11](=[O:12])[CH:16]=[CH:15]1Participants
3
Procedure
The same procedure described in Example 1 was repeated but 2-tetrahydropyranyl 5-norbornene-2-carboxylate, prepared according to Preparation Example III was used instead of tert-butyl 5-norbornene-2 carboxylate, to obtain the title copolymer resin (formula V) having a molecular weight of 3,000-100,000 (yield: 68%). Though the protective group of the copolymer resin thus prepared was substituted by an acetal group, etching resistance of the resin did not deteriorate and the resin had excellent sensitivity (sensitivity: 11 Nj/cm2).
Workup
- customaccording to Preparation Example III
Sources & evidence
- ORD record
- ord-679a019975d64aa8a287364c3b72af51
- Source dataset
- uspto-grants-2002_04
- Patent number
- US06369181B1
Reaction notes
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