Chlorine → HCID 69517714, compound
Reaction equation
[CH3:1][C:2]1[C:11]([CH3:12])=[C:10]2[C:5]([CH:6]=[C:7]([C:17]([O:19][CH2:20][CH3:21])=[O:18])[CH:8]([C:13]([F:16])([F:15])[F:14])[O:9]2)=[CH:4][CH:3]=1.[Cl:22]Cl>CC(O)=O>[Cl:22][C:3]1[CH:4]=[C:5]2[C:10](=[C:11]([CH3:12])[C:2]=1[CH3:1])[O:9][CH:8]([C:13]([F:16])([F:14])[F:15])[C:7]([C:17]([O:19][CH2:20][CH3:21])=[O:18])=[CH:6]2Participants
4
Reactant 2
Product 1
Reagents, catalysts & solvents 1
Procedure
To a solution of ethyl 7,8-dimethyl-2-(trifluoromethyl)-2H-chromene-3-carboxylat (4.0 g, 13.3 mmol) in 75 mL HOAc was added Cl2 until the solvent was saturated as indicated by the greenish chlorine cloud above the solvent. After 2 h, the reaction was flushed with N2 and subsequently treated with excess Zn dust for 1.5 h. The reaction mixture was decanted from the Zn and concentrated under vacuum. The resulting residue was dissolved in 300 mL of EtOAc and washed with 100 mL 1 M KHSO4 and 100 mL brine. The organic layer was dried over MgSO4, filtered and concentrated under vacuum. The yield of ethyl 6-chloro-7,8-dimethyl-2-(trifluoromethyl)-2H-chromene-3-carboxylate was 5.2 g.
Workup
- customthe reaction was flushed with N2
- additionsubsequently treated with excess Zn dust for 1.5 h
- customThe reaction mixture was decanted from the Zn
- concentrationconcentrated under vacuum
- dissolutionThe resulting residue was dissolved in 300 mL of EtOAc
- washwashed with 100 mL 1 M KHSO4 and 100 mL brine
- dry with materialThe organic layer was dried over MgSO4
- filtrationfiltered
- concentrationconcentrated under vacuum
Sources & evidence
- ORD record
- ord-7fd4eff211014cc9acdde63902cd40bd
- Source dataset
- uspto-grants-2007_08
- Patent number
- US07259266B2
Reaction notes
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