HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 861886Generated: October 30, 2026
Trimethylsilyl iodide → HCID 19700501, compound
https://huagongshe.com/reaction/861886
Participants
| Role | Name | HCID | Charge |
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| Reactant | Trimethylsilyl iodide | HCID 85247 | — |
| Reactant | HCID 9805227 | HCID 9805227 | — |
| Solvent | Carbon Tetrachloride | HCID 5943 | — |
| Product | HCID 19700501 | HCID 19700501 | 63.4% |
Reaction Steps
Iodotrimethylsilane [(CH3)3SiI] (0.458 g) was added to a suspension of 7-cyclohexyl-N-(4-diethoxyphosphorylmethylphenyl)-3,4-dihydronaphthalene-2-carboxamide (0.5 g) in carbon tetrachloride (10 ml) at 0° C. After stirring at 0° C. for 1 hour and then at room temperature for 15 hours, this mixture was concentrated under reduced pressure. To the residue, methanol (6 ml) was added; this mixture was acidified with 1N HCl and stirred at room temperature for 30 minutes. The resulting crystals were collected by filtration and recrystallized from methanol-water to yield 7-cyclohexyl-N-(4-phosphonomethylphenyl)-3,4-dihydronaphthalene-2-carboxamide (0.28 g, 63%) as pale yellow prisms having a melting point of 203°-205° C.
Provenance & Evidence
| DOI | 10.6084/m9.figshare.5104873.v1 |
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| Patent number | US05716944 |
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| Source dataset | uspto-grants-1998_02 |
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| ORD ID | ord-48e32cd2f2ae414ea263df18048a0a3b |
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| Source note | uspto-grants-1998_02 |
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