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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 861886Generated: October 30, 2026

Trimethylsilyl iodide → HCID 19700501, compound

https://huagongshe.com/reaction/861886

Reaction equation

Participants

RoleNameHCIDCharge
ReactantTrimethylsilyl iodideHCID 85247—
ReactantHCID 9805227HCID 9805227—
SolventCarbon TetrachlorideHCID 5943—
ProductHCID 19700501HCID 1970050163.4%

Reaction Conditions

Temperature0 °C

Reaction Steps

Iodotrimethylsilane [(CH3)3SiI] (0.458 g) was added to a suspension of 7-cyclohexyl-N-(4-diethoxyphosphorylmethylphenyl)-3,4-dihydronaphthalene-2-carboxamide (0.5 g) in carbon tetrachloride (10 ml) at 0° C. After stirring at 0° C. for 1 hour and then at room temperature for 15 hours, this mixture was concentrated under reduced pressure. To the residue, methanol (6 ml) was added; this mixture was acidified with 1N HCl and stirred at room temperature for 30 minutes. The resulting crystals were collected by filtration and recrystallized from methanol-water to yield 7-cyclohexyl-N-(4-phosphonomethylphenyl)-3,4-dihydronaphthalene-2-carboxamide (0.28 g, 63%) as pale yellow prisms having a melting point of 203°-205° C.

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS05716944
Source datasetuspto-grants-1998_02
ORD IDord-48e32cd2f2ae414ea263df18048a0a3b
Source noteuspto-grants-1998_02