反应详情

Compound 2 (6.0 g, 16.3 mmol) was treated with 4N HCl-dioxane (64 ml) for 1 h at room temperature. After the solvent was removed, the residue was extracted with EtOAc, washed with 5% citric acid and saturated NaCl. Then, the organic layer was dried over Na2SO4 and evaporated in vacuo to obtain compound 3. yield 2.6 g (76%); m.p. 150-155° C.; 1H NMR (300 MHz, DMSO-d6) δ 8.59 (s, 1H), 6.55 (s, 1H), 1.36 (s, 1H); m/z 211.0841 (M+) (calcd for C10H13NO4: 211.0844).

1. customAfter the solvent was removed
2. extractionthe residue was extracted with EtOAc
3. washwashed with 5% citric acid and saturated NaCl
4. dry with materialThen, the organic layer was dried over Na2SO4
5. customevaporated in vacuo